Substrate processing apparatus and substrate processing method
US7086410B2 · kind B2 · utility
21Cited by
15References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2003 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Mar 7, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/87917
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A common solvent vapor supply source 41 and a common processing gas supply source 42 supply ozone gas and steam to a plurality of processing vessels 30A, 30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves 50A, 50B, which are placed in exhaust lines 80A, 80B, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.