Fluoropolymer and resist composition
US7091294B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 2005 |
| Grant date | Aug 15, 2006 |
| Priority date | — |
| Expiry date | Apr 7, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/18
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A fluoropolymer (A) having units derived from monomer units formed by cyclopolymerization of at least one fluorinated diene selected from a fluorinated diene represented by the formula (1) and a fluorinated diene represented by the formula (2), and units derived from monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (3):CF2═CFCF2—C(CF3)(OR1)—CH2CH═CH2 (1)CF2═CFCH2—CH((CH2)nC(CF3)2(OR1))—CH2CH═CH2 (2)CF2═CFCH2—CH(COOR2)—CH2CH═CH2 (3)wherein R1 represents a hydrogen atom, a blocked group of a hydroxyl group capable of being converted into a hydrogen atom by an acid, or a blocked carboxyl group-containing organic group capable of being converted into a carboxyl group-containing organic group by an acid, R2 represents a hydrocarbon group having at most 20 carbon atoms, and n represents 0 or 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.