System and method for monitoring contamination
US7092077B2 · kind B2 · utility
5Cited by
37References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2003 |
| Grant date | Aug 15, 2006 |
| Priority date | — |
| Expiry date | Sep 15, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/405
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.