EUV source
US7095038B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2004 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Sep 22, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The EUV radiation source of the invention comprises an irradiation chamber (1) containing an irradiation zone (3) into which a stream of radiation-generator material is generated such as a flow of xenon propagating along a direction (II—II) extending transversely relative to an optical axis (I—I). The irradiation zone (3) is in the proximity of a diaphragm (4) oriented on the optical axis (I—I) and putting the irradiation chamber (1) into communication with a transmission chamber (2). Power laser beams (5, 6) strike the stream of radiation-generator material in the irradiation zone (3) and produce EUV radiation which propagates through the diaphragm (4) and which is conditioned in the transmission chamber (2) by elliptical mirrors (13). Differential pumps (11, 12) maintain a pressure P2 in the transmission chamber (2) that is well below the pressure P1 in the irradiation chamber (1). The low pressure in the transmission chamber (2) ensures that the EUV radiation is transmitted with little attenuation to a zone of use, without requiring voluminous high speed pumps (11, 12).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.