Lithographic linear motor, lithographic apparatus, and device manufacturing method
US7095485B2 · kind B2 · utility
6Cited by
9References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2004 |
| Grant date | Aug 22, 2006 |
| Priority date | — |
| Expiry date | Aug 6, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02K2201/18
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.