Particulate removal from an electrostatic chuck
US7097714B2 · kind B2 · utility
2Cited by
3References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 18, 2003 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Apr 6, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The cleaning of particles from an electrostatic chuck. In one embodiment, a method of cleaning an electrostatic chuck in a processing chamber is disclosed. The method comprises directing a flow of gas across the electrostatic chuck to dislodge particles from the electrostatic chuck and removing the flow of gas and particles through an exhaust port in the processing chamber. In this embodiment, the vacuum integrity of the chamber is not compromised during the cleaning of the electrostatic chuck.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.