Plasma processing device
US7097735B2 · kind B2 · utility
8Cited by
8References
58Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Mar 28, 2002 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Nov 22, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32192
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.