Adjustable illumination source
US7098466B2 · kind B2 · utility
3Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2004 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Feb 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70583
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to an embodiment of the invention, an adjustable EUV light source may be used for photolithography. The EUV light source, such as an electrode, is mounted in an adjustable housing. The housing can be adjusted to change the distance between the light source and focusing mirrors, which in turn changes the partial coherence value of the system. The partial coherence value can be changed to print different types of semiconductor features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.