Patent · US Expired

System semiconductor device and method of manufacturing the same

US7098538B1 · kind B1 · utility

2Cited by
7References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 7, 2000
Grant dateAug 29, 2006
Priority date
Expiry dateDec 15, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/3011
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A system semiconductor device includes a system LSI cell portion and a global wiring layer. The system LSI cell portion has a plurality of functional blocks for realizing specific functions on a semiconductor chip. The global wiring layer has a wiring layer on a semiconductor substrate. The system LSI cell portion is laminated with the global wiring layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.