Plasma generator
US7098599B2 · kind B2 · utility
4Cited by
13References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2000 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Jun 13, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.