Yuichi Setsuhara
10Patents
4h-index
19Co-inventors
53Inventor score
Filing activity: Dec 27, 2000 → Jul 14, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7567037B2 | High frequency power supply device and plasma generator | Electricity | 14 | Expired |
| US7785441B2 | Plasma generator, plasma control method, and method of producing substrate | Electricity | 4 | Expired |
| US7098599B2 | Plasma generator | Electricity | 4 | Expired |
| US7880392B2 | Plasma producing method and apparatus as well as plasma processing apparatus | Electricity | 4 | Active |
| US7988835B2 | Silicon dot forming method and silicon dot forming apparatus | Electricity | 2 | Active |
| US8444806B2 | Plasma generator, plasma control method and method of producing substrate | Electricity | 2 | Active |
| US8916034B2 | Thin-film forming sputtering system | Electricity | 1 | Active |
| US9078336B2 | Radio-frequency antenna unit and plasma processing apparatus | Electricity | 0 | Active |
| US8931433B2 | Plasma processing apparatus | Chemistry; Metallurgy | 0 | Active |
| US8419894B2 | Plasma generator, plasma control method and method of producing substrate | General | 0 | Revoked |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.