Exposure method, exposure apparatus, and method for manufacturing device
US7098991B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2004 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Oct 5, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment of the invention, a pattern of a mask is transferred onto a substrate via a projection optical system using an energy beam by placing a substrate on side of an energy beam emitting end portion of projection optical system, when the substrate is exposed, and placing an object on the side of the energy beam emitting end portion of the projection optical system in place of the substrate when the substrate is exchanged. This can adequately remove a light absorptive substance from the region near an output end of the projection optical system and can maintain the gas state even at a time of moving or replacing the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.