System and method for determining line widths of free-standing structures resulting from a semiconductor manufacturing process
US7101817B2 · kind B2 · utility
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2References
7Claims
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Key dates
| Filing date | Nov 5, 2004 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Nov 5, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A apparatus and method for determining minimum line widths of free standing structures built by a semiconductor (S/C) manufacturing process. Free standing structures are created in a semiconductor device and subjected to an aerosol process which is tuned and centered with respect to a critical line width for the free standing structures. The S/C manufacturing process is tuned responsive to failure of free standing structures of sub-critical line widths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.