Lithographic apparatus, measurement system, and device manufacturing method
US7102729B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2004 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Apr 2, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of the reference part being within an area of said plane of movement that is bounded by a closed contour having a shape. The measurement system comprises a sensor head that operatively communicates with a planar element. The sensor head is mounted onto the base and the planar element being mounted onto the reference part of the moveable object or the other way around, wherein the planar element has a shape that is essentially identical to the shape of the closed contour.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.