Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element
US7102732B2 · kind B2 · utility
0Cited by
16References
21Claims
0Family size
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Key dates
| Filing date | Apr 28, 2003 |
| Grant date | Sep 5, 2006 |
| Priority date | — |
| Expiry date | Jan 14, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3007
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.