Gate structure and method
US7105891B2 · kind B2 · utility
60Cited by
9References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2002 |
| Grant date | Sep 12, 2006 |
| Priority date | — |
| Expiry date | Jul 15, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/038
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
CMOS gate structure with metal gates having differing work functions by texture differences between NMOS and PMOS gates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.