Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom

US7108001B2 · kind B2 · utility

Inventors

• Keith Pope · Milwaukie, US
• David Mount · North Andover, US
• Laura Rothman · Sherman, US
• Rick White · Nashua, US
• Clifton Busby · Georges Mills, US
• Stephen Douglas · Boxborough, US
• Raymond J Doww, III · Amherst, US

Key dates

• Filing date: Apr 5, 2004
• Grant date: Sep 19, 2006
• Expiry date: Apr 5, 2024

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S134/902
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.