Determination of center of focus by cross-section analysis
US7110099B2 · kind B2 · utility
12Cited by
42References
62Claims
0Family size
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Key dates
| Filing date | Oct 10, 2002 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Sep 8, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70675
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods for determination of parameters in lithographic devices and applications by cross-section analysis of scatterometry models, including determination of center of focus in lithography devices and applications. Control methods are provided for process control of center of focus in lithography devices utilizing cross-section analysis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.