Thermal treatment equipment, thermal treatment method and manufacturing method of image display apparatus
US7110665B2 · kind B2 · utility
6Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2004 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Sep 21, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In an apparatus for performing heating treatment of a structure composed of a substrate and a structure arranged on the front surface of the substrate, the latter structure having thermal capacity smaller than that of the substrate, heaters are arranged to be opposed to the front surface and the back surface of the substrate. A cooling body is arranged at a position opposed to the back surface of the substrate to sandwich the heater of the back surface between the cooling body and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.