Patent · US Expired

Catadioptric projection objective with adaptive mirror and projection exposure method

US7112772B2 · kind B2 · utility

15Cited by

16References

35Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Cristian Wagner · Aalen, DE
Michael Gerhard · Aalen, DE
Gerald Richter · Aachen, DE

Key dates

Filing date	Jan 17, 2004
Grant date	Sep 26, 2006
Priority date	—
Expiry date	Jul 30, 2024

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70266
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.