Michael Gerhard
33Patents
9h-index
70Co-inventors
78Inventor score
Filing activity: Feb 19, 1999 → Sep 27, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6252712A | Optical system with polarization compensator | Emerging Cross-Sectional Technologies | 123 | Expired |
| US6388823B1 | Optical system, especially a projection light facility for microlithography | Physics | 63 | Expired |
| US7145720B2 | Objective with fluoride crystal lenses | Emerging Cross-Sectional Technologies | 62 | Expired |
| US6774984B2 | Optical imaging system with polarizer and a crystalline-quartz plate for use therewith | Physics | 60 | Expired |
| US6697199B2 | Objective with lenses made of a crystalline material | Physics | 23 | Expired |
| US7112772B2 | Catadioptric projection objective with adaptive mirror and projection exposure method | Physics | 15 | Expired |
| US7199864B2 | Polarization rotator and a crystalline-quartz plate for use in an optical imaging system | Physics | 12 | Expired |
| US6891980B2 | Method and apparatus for analysis of schlieren | Physics | 12 | Expired |
| US6667839B2 | Holding device for an optical element made of a crystalline material | Chemistry; Metallurgy | 9 | Expired |
| US7294814B2 | Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same | Physics | 8 | Active |
| US8705005B2 | Microlithographic illumination system | Physics | 6 | Active |
| US6936825B2 | Process for the decontamination of microlithographic projection exposure devices | Physics | 5 | Expired |
| US7271876B2 | Projection objective for microlithography | Physics | 5 | Expired |
| US8873023B2 | Illumination system for microlithography | Physics | 4 | Active |
| US9280060B2 | Illumination system for microlithography | Physics | 3 | Active |
| US8870396B2 | Substrates for mirrors for EUV lithography and their production | Chemistry; Metallurgy | 3 | Active |
| US7880969B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
| US7180667B2 | Objective with fluoride crystal lenses | Emerging Cross-Sectional Technologies | 2 | Expired |
| US9310693B2 | Method for operating a projection exposure tool and control apparatus | Physics | 1 | Active |
| US6842284B2 | Objective with lenses made of a crystalline material | Physics | 1 | Expired |
| US6836379B2 | Catadioptric objective | Physics | 1 | Expired |
| US7126765B2 | Objective with fluoride crystal lenses | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8520307B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US9606441B2 | Illumination system for microlithography | Physics | 1 | Active |
| US8411251B2 | Optical element and illumination optics for microlithography | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.