Exposure apparatus and device manufacturing method
US7116397B2 · kind B2 · utility
0Cited by
12References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 29, 2005 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | Dec 10, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an optical system having a first optical element, for directing light from a light source to a member to be exposed. The first optical element serves to separate first and second spaces inside the optical system, and the first optical element has a first notch formed at an end portion outside an effective light flux of light from the light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.