Method and system for utilizing an isofocal contour to perform optical and process corrections
US7117475B2 · kind B2 · utility
4Cited by
4References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 18, 2004 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | Feb 1, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system for performing optical proximity correction (OPC) on an integrated circuit (IC) mask design is disclosed. The system and method of the present invention includes identifying a feature in the IC mask design, generating an isofocal contour for the identified feature, wherein the isofocal contour is a continuum of isofocal points corresponding to points on an edge of the identified feature, and utilizing the isofocal contour to estimate an amount of correction needed to produce a resist image significantly identical to the identified feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.