Lithographic apparatus and device manufacturing method
US7119874B2 · kind B2 · utility
118Cited by
20References
48Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2004 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | Jun 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus wherein a liquid supply system provides a space between a projection system and a substrate with liquid. The liquid supply system comprises a member. A liquid seal is formed between the member and the substrate by a flow of liquid. In an embodiment, the liquid seal is formed by a flow of liquid from an inlet to an outlet of the member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.