Methods and apparatus for calibration and metrology for an integrated RF generator system
US7122965B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 23, 2004 |
| Grant date | Oct 17, 2006 |
| Priority date | — |
| Expiry date | Jul 23, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.