Method and device for producing extreme ultraviolet radiation and soft x-ray radiation

US7126143B2 · kind B2 · utility

Assignees

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE
• Philips Corporate Intellectual Property GmbH · DE
• KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

• Jurgen Klein · Essen, DE
• Willi Neff · Kelmis, BE
• Stefan Seiwart · Aachen, DE
• Klaus Bergmann · Heilbronn, DE
• Joseph Pankert · Aachen, DE
• Michael R. Loken · Mercer Island, US

Key dates

• Filing date: Mar 23, 2002
• Grant date: Oct 24, 2006
• Expiry date: Jun 20, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70033
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography,wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (Uz), generate a plasma (17) located in the area between their openings (14, 15), which plasma is a source of the radiation (17′) to be generated,wherein an ignition of the plasma (17) is realized by affecting the gas pressure and/or by triggering,and wherein, with the ignition of the plasma (17), an energy storage device supplies by means of the electrodes (11, 12) stored energy into the plasma (17), characterized in that the ignition of the plasma (17) is realized by using a predetermined ignition delay (18).