Method for reducing reticle set cost
US7127698B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 17, 2003 |
| Grant date | Oct 24, 2006 |
| Priority date | — |
| Expiry date | Nov 6, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of making a reticle. Design data, i.e., GDSII data is read in, then a scribe or frame is built, and the design is placed in the scribe. Then, Boolean operations, sizing, OPC corrections and phase shifting are performed, as needed, perhaps using third party tools. Then, the GDS data is sorted, and a new GDS hierarchy is created where each mask layer can be generated as one mask making pattern, i.e., new cells are created representing each masking image location on the reticle, each new cell is placed in a topcell, then a gds2 file is produced where the gds2 file can be used to create a reticle or can be used to create reticle making data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.