Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process

US7127699B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Gregg M. Gallatin · Newtown, US
• Emanuel Gofman · Haifa, IL
• Kafai Lai · Poughkeepsie, US
• Mark A. Lavin · Katonah, US
• Maharaj Mukherjee · Poughkeepsie, US
• Dov Ramm · Gdera, IL
• Alan E. Rosenbluth · Yorktown Heights, US
• Shlomo Shlafman · Haifa, IL

Key dates

• Filing date: Dec 16, 2003
• Grant date: Oct 24, 2006
• Expiry date: Nov 2, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/36
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method is provided for optimizing the number of kernels N used in a sum of coherent sources (SOCS) for optical proximity correction in an optical microlithography process, including setting the number of kernels N to a predetermined minimum value Nmin, where a determination is made as to whether an accuracy estimate of calculated intensity is within a tolerable value, and a determination is also made as to whether an added X/Y asymmetry estimate of the calculated intensity is negligible.