Reactive gas filter
US7132011B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2003 |
| Grant date | Nov 7, 2006 |
| Priority date | — |
| Expiry date | Nov 29, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2253/102
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In preferred embodiments, the invention provides a gas filter for a reactive gas used in semiconductor processing tools and processes that are sensitive to molecular contamination. The reactive gas filter of the invention have improved pressure drop and can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv. In one aspect the invention provides a reactive gas filter with an improved pressure drop that can supply an output gas stream having concentrations of less than about 1 ppbv for both ammonia and sulfur dioxide for an input gas stream with ammonia and sulfur dioxide concentrations, respectively, of no greater than about 10 ppbv and 5 ppbv, using a filter media volume of no greater than about 0.5 liters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.