Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces

US7133140B2 · kind B2 · utility

Assignees

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE
• Hungarian Academy of Sciences Research Institute for Technical Physics and Materials Science · HU

Inventors

• István Endre Lukács · Budapest, HU
• János Makai · Budapest, HU
• Lothar Pfitzner · Erlangen, DE
• Ferenc Riesz · Szentendre, HU
• Béla Szentpali · Budapest, HU

Key dates

• Filing date: Apr 1, 2004
• Grant date: Nov 7, 2006
• Expiry date: Apr 1, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N21/9501
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Apparatus and process for fast, quantitative, non-contact topographic investigation of samples. Apparatus includes a light source, and a collimating concave mirror structured and arranged to produce a parallel beam and to direct the parallel beam to a sample to be investigated. A structured mask is located between the light source and the concave mirror, and an image sensor structured and arranged to receive a beam reflected from the sample and the concave mirror. Relative positions of the mask and the sensor to other elements of the apparatus are chosen to provide an essentially sharp image of the mask on the sensor. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.