Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
US7138343B2 · kind B2 · utility
4Cited by
11References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2003 |
| Grant date | Nov 21, 2006 |
| Priority date | — |
| Expiry date | Nov 13, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In order to produce substrate surfaces with a given two-dimensional surface distribution arising from a treatment using a vacuum treatment process, an inhomogeneous plasma (5) with a density distribution is generated and moved relative to the substrate (9) with a given movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.