Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system
US7138641B2 · kind B2 · utility
5Cited by
6References
39Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2005 |
| Grant date | Nov 21, 2006 |
| Priority date | — |
| Expiry date | May 31, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A beam deflector for scanning performs deflecting of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle beam. The beam deflector comprises a pair of deflection electrodes disposed so as to confront each inner electrode surface having a symmetrical concave extending in a direction of a beam trajectory.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.