Mitsukuni Tsukihara
26Patents
7h-index
33Co-inventors
65Inventor score
Filing activity: Jun 18, 1999 → Aug 7, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6242747A | Method and system for optimizing linac operational parameters | Electricity | 36 | Expired |
| US6794661B2 | Ion implantation apparatus capable of increasing beam current | Electricity | 29 | Expired |
| US6573517B1 | Ion implantation apparatus | Electricity | 23 | Expired |
| US7351987B2 | Irradiation system with ion beam | Electricity | 12 | Expired |
| US7187143B2 | Mover device and semiconductor manufacturing apparatus and method | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6984833B2 | Ion implanter and method for controlling the same | Electricity | 7 | Expired |
| US6797968B2 | Ion beam processing method and apparatus therefor | Electricity | 7 | Expired |
| US7429743B2 | Irradiation system ion beam and method to enhance accuracy of irradiation | Electricity | 7 | Expired |
| US7276711B2 | Beam space-charge compensation device and ion implantation system having the same | Electricity | 6 | Expired |
| US7361892B2 | Method to increase low-energy beam current in irradiation system with ion beam | Electricity | 6 | Active |
| US7982192B2 | Beam processing apparatus | Electricity | 5 | Active |
| US7138641B2 | Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system | Electricity | 5 | Expired |
| US7851772B2 | Ion implantation apparatus and ion implantation method | Electricity | 5 | Active |
| US9502210B2 | Ion implanter, ion implantation method, and beam measurement apparatus | Electricity | 4 | Active |
| US6635889B2 | Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof | Electricity | 4 | Expired |
| US7755067B2 | Ion implantation apparatus and method of converging/shaping ion beam used therefor | Electricity | 4 | Active |
| US7304319B2 | Wafer charge compensation device and ion implantation system having the same | Electricity | 4 | Expired |
| US7315034B2 | Irradiation system with ion beam/charged particle beam | Electricity | 4 | Active |
| US9449791B2 | Beam irradiation apparatus and beam irradiation method | Electricity | 3 | Active |
| US7718980B2 | Beam processing system and beam processing method | Electricity | 3 | Active |
| US7791049B2 | Ion implantation apparatus | Electricity | 2 | Active |
| US7687782B2 | Electrostatic beam deflection scanner and beam deflection scanning method | Electricity | 2 | Active |
| US7597531B2 | Method of controlling mover device | Emerging Cross-Sectional Technologies | 1 | Active |
| US7411709B2 | Beam processing system and beam processing method | Emerging Cross-Sectional Technologies | 0 | Active |
| US8759801B2 | Ion implantation apparatus and ion implantation method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.