Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7139081B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 9, 2003 |
| Grant date | Nov 21, 2006 |
| Priority date | — |
| Expiry date | May 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method including: imaging test light emerging from a test object over a range of angles to interfere with reference light on a detector, wherein the test and reference light are derived from a common source; for each of the angles, simultaneously varying an optical path length difference from the source to the detector between interfering portions of the test and reference light at a rate that depends on the angle at which the test light emerges from the test object; and determining an angle-dependence of an optical property of the test object based on the interference between the test and reference light as the optical path length difference is varied for each of the angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.