Compliant hard template for UV imprinting
US7140861B2 · kind B2 · utility
105Cited by
66References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2004 |
| Grant date | Nov 28, 2006 |
| Priority date | — |
| Expiry date | May 24, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2043/025
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.