Patent · US Expired

Sub-resolution sized assist features

US7141338B2 · kind B2 · utility

9Cited by

9References

12Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Xiaochun Chen · Hopewell Junction, US
Lawrence Varnerin · Watchung, US
Bernhard R. Liegl · Cold Spring, US

Key dates

Filing date	Nov 12, 2002
Grant date	Nov 28, 2006
Priority date	—
Expiry date	Nov 17, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Corner rounding and image shortening is substantially reduced in an image printed on a substrate by illuminating a photolithographic mask and projecting light transmitted through the photolithographic mask onto the substrate using an optical projection system. The photolithographic mask has a mask pattern that includes at least one printable feature having at least one corner. Incorporated, in the mask pattern, is at least one line feature corresponding to the corner of the printable feature. The line feature is in at least close proximity to the corresponding corner of the printable feature and has a line width that is smaller than a minimum resolution of the optical projection system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.