Centrifugal swing arm spray processor
US7144459B2 · kind B2 · utility
2Cited by
7References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 19, 2002 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | May 12, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A machine for processing a flat workpiece or wafer has a head, which spins the wafer between upper and lower weirs in a base. The head is spaced apart from the base by an air gap. A vacuum source attached to an exhaust opening in the base draw air through the air gap, to reduce or eliminate movement of process chemicals into the head. Corrosion of head components by process chemicals is reduced. The disadvantages of having a mechanical seal between the base and the head are also eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.