Exposure technique
US7145629B2 · kind B2 · utility
2Cited by
6References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 1, 2004 |
| Grant date | Dec 5, 2006 |
| Priority date | — |
| Expiry date | Jan 12, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An atmosphere control technique for an exposure apparatus. An exposure apparatus to which this technique is applied includes, for example, a chamber which contains a space through which exposure light passes, a circulation system which has a path and circulates an inert gas through the path and the chamber, at least one valve provided in the path, a supply system which has a supply port at one end of a zone of the path defined by the at least one valve and supplies an inert gas to the supply port, and an exhaust system which has an exhaust port at the other end of the zone and exhausts a gas from the exhaust port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.