Illumination system, particularly for EUV lithography

US7148495B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jorg Schultz · Aalen, DE
• Johannes Wangler · Oberkochen, DE

Key dates

• Filing date: Jan 6, 2004
• Grant date: Dec 12, 2006
• Expiry date: Jan 6, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K5/00
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

There is provided an illumination system. The illumination system includes a light source for emitting light having a wavelength ≦193 nm, an optical system, and a radiation protection wall situated between the light source and the optical system.