System and method for proximity effect correction in imaging systems
US7148496B2 · kind B2 · utility
2Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2004 |
| Grant date | Dec 12, 2006 |
| Priority date | — |
| Expiry date | Apr 13, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31769
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.