Multivariate control of semiconductor processes
US7151976B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 16, 2005 |
| Grant date | Dec 19, 2006 |
| Priority date | — |
| Expiry date | Sep 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/80
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method for detecting a fault condition of a manufacturing process involving acquiring data and developing a model based on a plurality of manufacturing related variables for a plurality of outputs of a manufacturing process. The method also involves identifying which of the manufacturing related variables have a substantial affect on the model for detecting faulty outputs of the manufacturing process. The method also involves updating the model by using the manufacturing related variables identified as having a substantial affect on the model to improve the ability of the model to detect faulty outputs of the manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.