Method and apparatus for determination of the depth of depressions which are formed in a mount substrate
US7152461B2 · kind B2 · utility
5Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2005 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | Apr 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N5/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a method for determination of the depth of depressions which are formed in a mount substrate. According to the invention, an essentially uniform layer of a wetting agent is applied, which contains depressions, on a surface of the mount substrate, a time profile of the decrease in weight of the mount substrate is recorded, and the recorded time profile of the decrease in weight of the mount substrate is evaluated. The invention also relates to a measurement apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.