Extreme ultraviolet pellicle using a thin film and supportive mesh
US7153615B2 · kind B2 · utility
15Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 20, 2003 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | Mar 22, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An extreme ultraviolet (EUV) pellicle including a thin film or membrane and a supportive wire mesh. The pellicle allows EUV radiation to pass through the pellicle to a reticle but prevents particles from passing through the pellicle. A buffer gas supports the film against the wire mesh. The film or membrane may be embedded with support fibers or beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.