Method for pattern inspection
US7155052B2 · kind B2 · utility
16Cited by
16References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2002 |
| Grant date | Dec 26, 2006 |
| Priority date | — |
| Expiry date | May 5, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for inspecting a patterned surface employs reference data related to the pattern to provide a map for identifying regions which are expected to generate equivalent images. These regions are then compared in an image-to-image comparison to identify possible defects. In a first implementation, the regions are related by local symmetry operators. In a second, disjoint corner features or other features are classified and similar features compared.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.