Enhancement of membrane characteristics in semiconductor device with membrane
US7157781B2 · kind B2 · utility
8Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2003 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Dec 7, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/019
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A semiconductor device having a membrane includes a semiconductor substrate, which has an active surface, and a membrane. A cavity is located between the active surface and the membrane and hermetically sealed. The membrane includes a first film, which has a through hole that extends through the first film, and a second film, which has been formed by reflowing a reflow layer made of a material that becomes viscous and reflows when heated. The through hole has been plugged by the second film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.