Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
US7158553B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2004 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Jan 9, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2333
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.