X-ray crystal orientation measuring method and X-ray crystal orientation measuring apparatus
US7158609B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2004 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Feb 9, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/205
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray crystal orientation measuring apparatus and a method thereof, for enabling to measure distribution of crystal orientations upon a crystal having the sub-grain structure, lineage structure, other than the single domain, with using X-ray, comprises, an XY stage 20 for mounting a crystal S to be measured thereon and being movable in X-Y directions, an X-ray generating device 50 for irradiating X-ray at a predetermined angle upon a measuring surface of the crystal to be measured on the stage, a high-sensitive two-dimensional detector 60 for detecting the diffraction image of X-ray, which is irradiated from the X-ray generating device upon the measuring surface of the crystal to be measured, and a control PC, wherein the control PC calculates out a central position of the diffraction image detected, from the detected screen, so as to calculate out the crystal orientation upon the measuring surface of the crystal to be measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.