Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
US7159537B2 · kind B2 · utility
38Cited by
1References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2004 |
| Grant date | Jan 9, 2007 |
| Priority date | — |
| Expiry date | Aug 26, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.