Dual stage lithographic apparatus and device manufacturing method
US7161659B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 24, 2005 |
| Grant date | Jan 9, 2007 |
| Priority date | — |
| Expiry date | May 24, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.