Photolithography system and method of monitoring the same
US7161660B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Dec 22, 2004 |
| Grant date | Jan 9, 2007 |
| Priority date | — |
| Expiry date | Apr 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.